Au/Cr-coated SiO₂/Si substrates are employed in the realms of nanotechnology, scanning electron microscopy (SEM), atomic force microscopy (AFM), and a variety of other scanning probe microscopy applications. Stanford Optics boasts extensive expertise in the fabrication and supply of high-quality optical products.
Our gold-plated silicon wafers serve as exceptional substrates, extensively utilized in the nanotechnology sector, scanning electron microscopy (SEM), atomic force microscopy (AFM), and various scanning probe microscopy applications. Additionally, they are ideal for cell culture, protein and DNA microarrays, and reflectometry. Each silicon wafer is meticulously coated with a 5 nm layer of chromium, followed by a 50 nm gold film, ensuring superior performance and reliability.
Our Au/Cr coated SiO₂/Si substrates are widely employed in the nanotechnology field, seamlessly integrating with SEM, AFM, and other scanning probe microscopy techniques. They are also pivotal in cell culture experiments, protein and DNA microarray development, and reflectometric analyses, providing a reliable foundation for advanced scientific research and technological innovations.
Each Au/Cr coated SiO₂/Si substrate is meticulously handled during storage and transportation. Our stringent packaging protocols ensure that the substrates maintain their pristine condition, safeguarding their quality and performance upon delivery.
Composition |
Au, Cr, SiO2, Si |
Film |
Au(111)=50 nm, ~ 50 nm at Room Temperature Cr=5 nm SiO2=300 nm Si(100) P type B doped ~525 um Prime Grade
|
Resistivity |
<0.005 ohm.cm |
Substrate Size |
4" diameter +/- 0.5 mm x 0.5 mm |
Polish |
One side polished |
Surface roughness |
< 10 A RMS |
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