Packing: The wafers are packed in a 1000-class clean room with a plastic bag to ensure the highest cleanliness and safety during shipping.
Cu Coated Ta/SiO2 Silicon Wafer can be used in the nano field, scanning electron microscopy (SEM), atomic force microscopy (AFM), and other scanning probe microscope ranging. Stanford Optics has rich experience in manufacturing and supplying high-quality Optical Products.
Cu-coated Ta/SiO2 silicon wafers are ideal substrates for various applications in the nano field, scanning electron microscopy (SEM), atomic force microscopy (AFM), and other scanning probe microscopy techniques. These wafers are also suitable for cell culture, protein DNA microarrays, and reflectometers. The silicon wafer is typically coated with a layer of copper (Cu) approximately 400nm thick, followed by a layer of tantalum (Ta) with a thickness of 50nm.
These wafers are widely used across multiple applications, including SEM, AFM, and other scanning probe microscopy techniques, as well as in cell culture, protein DNA microarrays, and reflectometers.
Our Cu-coated Ta/SiO2 silicon wafer is carefully handled throughout storage and transportation to maintain its quality in its original condition.
Packing: The wafers are packed in a 1000-class clean room with a plastic bag to ensure the highest cleanliness and safety during shipping.
Purity (%) |
>99.99 |
Size |
2, 4, 6, 8, 12” dia 0.525mm thickness Si Wafer 300 nm thickness SiO2 |
Orientation |
Cu <111> |
Thickness of Cu <111> |
400 nm |
Thickness of Ta |
50 nm |
Resistivities |
1-20 ohm-cm |
Structure |
P type, B doped, <100> orientation, SSP |
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