Ni Coated SiO2/Si Substrate Description
Ni-coated SiO2/Si substrates are commonly used as substrates in the nanotechnology field, including applications in scanning electron microscopy (SEM), atomic force microscopy (AFM), and other scanning probe microscopy systems. Additionally, they are suitable for use in cell culture, protein DNA microarrays, and reflectometers. These silicon wafers are typically plated with a 100nm thick layer of copper.
Ni Coated SiO2/Si Substrate Applications
These substrates are widely used in the nanotechnology sector, including for scanning electron microscopy (SEM), atomic force microscopy (AFM), and other scanning probe microscopy applications. They also have applications in cell culture, protein DNA microarrays, and reflectometers.
Ni Coated SiO2/Si Substrate Packaging
To maintain the quality of our Ni Coated SiO2/Si Substrate, it is carefully handled during storage and transportation, ensuring it remains in optimal condition.
Packing: Stored in a 1000-class clean room and packaged in a plastic bag.