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CY3454 Ni Coated SiO2/Si Substrate

Catalog No
CY3454
Compositions
Ni, SiO2, Si
Purity
>99.99%
Size
4”, 10x10x0.5 mm, or customized
Surface Finish
One side polished
Orientation
<100> ±0.5°

Ni-coated SiO2/Si substrates are ideal for applications in the nanotechnology field, including scanning electron microscopy (SEM), atomic force microscopy (AFM), and other scanning probe microscope systems. Stanford Optics has extensive experience in manufacturing and supplying high-quality optical products.

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Ni Coated SiO2/Si Substrate
Ni Coated SiO2/Si Substrate
Description
Specifications
Reviews

Ni Coated SiO2/Si Substrate Description

Ni-coated SiO2/Si substrates are commonly used as substrates in the nanotechnology field, including applications in scanning electron microscopy (SEM), atomic force microscopy (AFM), and other scanning probe microscopy systems. Additionally, they are suitable for use in cell culture, protein DNA microarrays, and reflectometers. These silicon wafers are typically plated with a 100nm thick layer of copper.

Ni Coated SiO2/Si Substrate Applications

These substrates are widely used in the nanotechnology sector, including for scanning electron microscopy (SEM), atomic force microscopy (AFM), and other scanning probe microscopy applications. They also have applications in cell culture, protein DNA microarrays, and reflectometers.

Ni Coated SiO2/Si Substrate Packaging

To maintain the quality of our Ni Coated SiO2/Si Substrate, it is carefully handled during storage and transportation, ensuring it remains in optimal condition.
Packing: Stored in a 1000-class clean room and packaged in a plastic bag.

Specifications

Nickel Film Thickness

100nm

Film Crystallinity

<111> - oriented polycrystals

Size

4" diameter +/- 0.5 mm, or customized

0.525 +/- 0.025 mm th

Surface finish

One side polished

Conductive type

Si P- type, B-doped

SiO2 Thickness

300 nm

Resistivity

1-20 ohm-cm

Orientation

<100> ±0.5°

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