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NK3861 Nickel Telluride CVD Film (NiTe2)

Catalog No
NK3861
Type
Single crystal grains
Substrate Material
SiO2/Si, Quartz, Sapphire, Silicon wafer, PET, etc.
Size
10*10, 15*15, 20*20 mm
Method
Chemical Vapor Deposition (CVD)

Stanford Optics proudly offers high-quality Nickel Telluride (NiTe₂) Chemical Vapor Deposition (CVD) Films, available on a variety of substrates. With extensive experience in manufacturing and supplying superior Nickel Telluride CVD Films, we cater to diverse industry needs with precision and excellence.

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Nickel Telluride CVD Film (NiTe2)
Nickel Telluride CVD Film (NiTe2)
Description
Specifications
Reviews

Nickel Telluride CVD Film (NiTe2) Description

Nickel Telluride CVD Films (NiTe₂) are meticulously deposited using advanced Chemical Vapor Deposition techniques on a range of substrates, including:

These films exhibit exceptional properties suitable for various high-performance applications, leveraging the unique characteristics of Nickel Telluride in cutting-edge technologies.

Nickel Telluride CVD Film (NiTe2) Application

Nickel Telluride CVD Films are versatile and find applications in numerous advanced fields, including:

  1. Optoelectronic Devices: Utilized in the fabrication of components for optoelectronic systems, enhancing performance and efficiency.

  2. Microelectronic Devices: Integral in the production of microelectronic circuits and components, contributing to miniaturization and functionality.

  3. Biological Sensing: Applied in biosensors for detecting biological markers with high sensitivity and specificity.

  4. Chemical Sensing: Employed in chemical sensors for accurate detection and analysis of various chemical substances.

  5. Other Advanced Fields: Suitable for emerging technologies and innovative applications that require high-quality conductive films.

Nickel Telluride CVD Film (NiTe2) Packaging

At Stanford Optics, we ensure that our Nickel Telluride CVD Films (NiTe₂) are meticulously handled during storage and transportation. This careful management preserves the integrity and quality of our products, maintaining their pristine condition from our facility to your location.

Specifications
Feature Details
Substrates SiO₂/Si, Quartz, Sapphire, Silicon Wafer, PET, etc.
Film Composition Nickel Telluride (NiTe₂)
Deposition Method Chemical Vapor Deposition (CVD)
Thickness Range Customized according to application requirements
Quality Control High purity and uniformity ensured through rigorous processes
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