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CY3438 Pt-plated Silicon Wafer (Pt Coated SiO2/Si Substrate)

Catalog No
CY3438
Compositions
Pt, Ti, SiO2, Si
Size
4” Dia.
Film Thickness
SiO2 500nm (N100), Pt 150mm, Ti 20nm

Pt Coated SiO2/Si Substrate can be used in the nano field, scanning electron microscopy (SEM), atomic force microscopy (AFM), and other scanning probe microscope ranging. Stanford Optics has rich experience in manufacturing and supplying high-quality Optical Products.

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Pt-plated Silicon Wafer
Pt-plated Silicon Wafer
Description
Specifications
Reviews

Pt Coated SiO2/Si Substrate Description

Pt-plated silicon wafers find extensive use as substrates in the nano field, scanning electron microscopy (SEM), atomic force microscopy (AFM), and other scanning probe microscopy techniques. They are also applied in cell culture, protein DNA microarrays, and reflectometers. Typically, the silicon wafer of this product is coated with a layer of platinum (Pt) approximately 150nm in thickness.

Pt Coated SiO2/Si Substrate Applications

These wafers are widely used in various applications, including SEM, AFM, and other types of scanning probe microscopy, as well as in cell culture, protein DNA microarrays, and reflectometers.

Pt Coated SiO2/Si Substrate Packaging

Our Pt-coated SiO2/Si substrate is carefully handled throughout storage and transportation to ensure the product retains its original quality.

 

Specifications

Composition

Pt, Ti, Si, SiO2

Film

SiO2 500nm (N100),

Pt 150mm, Ti 20nm

Substrate Size

4" diameter

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