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CY3452 Ti coated SiO2/Si Substrate

Catalog No
CY3452
Compositions
Ti, SiO2, Si
Size
2, 4, 6, 8”
Film Thickness
Ti: 15-100nm, or customized

Stanford Optics provides high-quality Ti-coated SiO₂/Si substrates designed for use in nanotechnology, surface analysis, and advanced material science. These wafers feature a thermally grown or deposited SiO₂ layer on single-crystal silicon, over which a controlled layer of titanium (Ti) is deposited via physical vapor deposition (PVD) or e-beam evaporation.

The Ti coating offers excellent adhesion, conductivity, and biocompatibility, making these wafers ideal for surface modification, functionalization, and high-resolution imaging.

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Ti coated SiO2/Si Substrate
Ti coated SiO2/Si Substrate
Description
Specifications
Reviews

Ti Coated SiO2/Si Substrate Applications

Ti-coated SiO₂/Si substrates are widely used in:

Ti Coated SiO2/Si Substrate Packaging

To ensure the highest quality, our Ti-coated Ta/SiO2 silicon wafers are carefully handled during storage and transportation, preserving their integrity.

Packing: The wafers are securely packaged in a 1000-class clean room environment within plastic bags to maintain cleanliness and safety during shipping.

Specifications

Composition

Ti, SiO2, Si

Size

2, 4, 6, 8”

Composition

Ti, SiO2, Si

Ti Film Thickness

15-100nm, or customized 

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